Tohoku University Technology: Semiconductor Integrated Circuit Device and Its Manufacturing Method: T06-167
Improvement of semiconductor chip yield and relaxation of design margins.
In semiconductor chips of the nanometer generation, even transistors of the same shape within the chip can exhibit different characteristics due to variations in the manufacturing process. As a result, issues arise such as a decrease in the yield of good chips or performance degradation even in good chips. The present invention aims to detect operational failures and performance degradation caused by variations in transistor characteristics after manufacturing, and to improve these characteristics through correction elements added to the transistors, thereby raising the operation of that part or the entire circuit to a good level and enhancing yield and performance.
- Company：Tohoku Techno Arch Co., Ltd.
- Price：Other
